Cleaning validation involves using an analytical instrument to perform quantitative analysis of residues in manufacturing equipment.
The analytical instrument and method must be selected to suit the analysis target. The total organic carbon analyzer (TOC), high-performance liquid chromatograph (HPLC), and UV-VIS spectrophotometer (UV) are commonly used for cleaning validation.
Due to its high sensitivity, the high-performance liquid chromatograph mass spectrometer (LC/MS) is expected to become more widely used in the future.
The table below summarizes the features of Shimadzu analytical instruments that can be used for cleaning validation.
